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NM_【Adopted by domestic semiconductor manufacturing companies】 Vacuum-compatible ultrasonic motor

[Adopted by domestic semiconductor manufacturers] An ultrasonic motor used in semiconductor manufacturing that combines high-speed movement and precise positioning in a vacuum.

Nanomotion's ultrasonic motors come in various sizes and are suitable for environments ranging from atmospheric pressure to ultra-high vacuum. We have built motion platforms for a wide range of applications, from various micro-stages in the semiconductor industry to 300mm wafer inspection stages. The features of Nanomotion's ultrasonic motors include backlash-free direct drive, allowing the stage to be held even without power. The motor alone can provide a driving force of up to 32N, but in situations where more torque is needed, multiple ultrasonic motors can be installed to increase the driving force. They can also be used in high vacuum environments, and a non-magnetic model is available for ion beam applications. ■ SE Motor (Latest Model) Speed range of 1μm to 500mm/sec, sub-nanometer step resolution, maximum driving force of 32N. This ultrasonic motor was developed with Nanomotion's involvement in a development consortium for 7nm processes and has garnered attention from domestic manufacturers. ■ HR Motor (Standard Model) Speed range of 1μm to 250mm/sec, 1nm step resolution, maximum driving force of 32N. This ultrasonic motor is widely used by domestic manufacturers.

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High torque precision positioning ultrasonic motor for multi-axis semiconductor manufacturing equipment.

Heavy objects can achieve both high-speed movement and high-precision positioning by increasing torque with multiple ultrasonic motors.

Nanomotion's ultrasonic motors "SE" and "HR" are products capable of high-speed movement (up to 500mm/sec) and high precision positioning of 1nm, even in a vacuum. A notable feature is the driving force; the HR8 motor has a maximum torque of 32N. For example, using four HR8 motors can achieve a torque of 128N, allowing for the stacking of multiple stages or the movement of heavy payloads. *The payload capacity varies significantly depending on conditions such as movement speed, precision, and stage size. ■ 1nm Multi-Axis Precision Stage for Semiconductor Manufacturing Evaluation A 3-axis stage used within a vacuum chamber, featuring sub-nanometer step resolution with SE motors. ■ Stage for Electron Beam and Ion Beam (FIB) A 4-axis (X-Y-Z-θ) stage designed for inspection, vacuum-compatible, and non-magnetic. Achieves high resolution of 1nm with position stability below 6nm. ■ Stage for Light Sheet Microscopy Achieves an accuracy of 10nm and stable low-speed operation (200nm/sec). It features 5 axes: XYZ and Tip-Tilt. *For other examples, please refer to the "Examples of Achievements" section below.

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